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CDS Liquid Supply System (200L)
CDS Liquid Supply System (200L)
- Process Step
- Application area
- 介绍
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- Commodity name: CDS Liquid Supply System (200L)
It features high automation, precise mixing ratios, and easy operation, while also boasting excellent corrosion resistance.
Operational Safety: Considerations for Corrosivity, Toxicity, Pressure Resistance, and Explosion Prevention
Zero Chemical Pollution: Components in contact with chemicals are fully compatible with them.
Microparticle Control: Filtered Recirculation
Equipment Material (Acidity/Alkalinity): The external structure of the CDS for acidic-alkaline solutions is made from WPP 10T板材, while the internal pipelines and components are crafted from PFA 451 HP material.
Diaphragm pump: Each chemical liquid is equipped with either two or one imported diaphragm pump made of PTFE material.
Meet the maximum demand flow: high-concentration chemicals such as H2SO4 and H3PO4
Automatic control operation: System unit and machine interface automation
Sampling and Analysis: Particle Count in Systems and Pipelines, as well as Metal Ion Sampling Analysis
Leak Alarm: Leak Detection and Emergency Shutdown System (EMO)
All chemical cabinets, manifold boxes, and valve boxes are equipped with leak detectors and alarm functions.
System Diagnosis: Operating Hours of Pump, Filter, and Valve
Maintenance and Servicing of Piping System: Auto Purge/Flush Function
Chemical Usage Statistics -
Widely used in automatic supply of chemical liquid for wet process equipment in industries such as integrated circuits, semiconductor material processing, LED, solar photovoltaic, MEMS and discrete devices
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CDS systems are mainly used for photolithography, wafer cleaning, wet etching, thin film preparation, chemical mechanical polishing, grinding, cleaning of accessory carriers and other processes
- Fully automatic pump switching function to achieve uninterrupted chemical delivery
- Safety interlock device that allows the system to automatically stop running under certain circumstances
- Automatic quality analysis during chemical delivery (online measurement)
- Circuit pressure monitoring to ensure constant pressure at the point of use
- Optimal pipeline layout and design
- Large flow centrifugal pump
- Pulsation damper diaphragm pump for conveying device
- Redundant pumps and filters
- Automatic start device for pumps and filters
- Manual flushing and purge system
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CDS systems are mainly used for photolithography, wafer cleaning, wet etching, thin film preparation, chemical mechanical polishing, grinding, cleaning of accessory carriers and other processes
- Fully automatic pump switching function to achieve uninterrupted chemical delivery
- Safety interlock device that allows the system to automatically stop running under certain circumstances
- Automatic quality analysis during chemical delivery (online measurement)
- Circuit pressure monitoring to ensure constant pressure at the point of use
- Optimal pipeline layout and design
- Large flow centrifugal pump
- Pulsation damper diaphragm pump for conveying device
- Redundant pumps and filters
- Automatic start device for pumps and filters
- Manual flushing and purge system
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