Chemical liquid circulation heater

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Chemical liquid circulation heater

No metal ion dissolution pollution, online heating type chemical liquid heating equipment

Product Features
Product Specification
Product Usage

- Commodity name: Chemical liquid circulation heater
No metal ion dissolution pollution, online heating type chemical liquid heating equipment

1. The heating part is made of high-purity glass carbon material, without metal ion dissolution. No surface protection film is required during wafer processing, which reduces the process and improves efficiency.

The independently developed O-ring structure can cope with acids, alkalis, and organic solutions.
2. It has built-in leak detection and temperature abnormality detection functions, and the temperature switch is built-in, which can automatically shut down to achieve safe use.

Heating machine	CHE-36-3-S
Controller	AIC-7-CH6-S
Heating method	Exchangeable resistor heater heating, the processing tank is directly circulated with the online pipe
Temperature setting range	25℃~80℃ depends on the actual environment and type of medicine
Temperature control accuracy	±0.5℃ (when the set temperature is 50-80℃)
Heater power consumption	6KW
Temperature control method	PID control, automatic tuning function
Temperature setting method	Up and down key settings
Temperature representation	4-digit number representation (minimum 0.1℃)
Liquid material for circulation system	Fluorinated resin, high-purity glass carbon material is used in the thermal contact surface
The circulation system allows internal pressure	0.3MPa
Circulating flow	15 (L/min) or above
Safety features	Automatic diagnosis function, power output stops and alarms after detection
External communication	RS232C
Heating machine size	Ｗ380×D350×H325 About 38kg
Controller size	ｗ145×D235×H213 About 5.2kg
Circulation system pipe diameter	PFA pipe (outer diameter 3/4″×inner diameter 5/8″)
Power supply (50/60Hz)	AC single phase 200V/30A

1. Temperature management of various chemical solutions for wafer processing in semiconductor processing · Polymer material removal solution
- RCA cleaning solution
- Etching solution
- Developer
2. Electroplating solution, various surface treatment solutions
- Acidic solution (fluoric acid, nitric acid, etc.)
- Alkaline solution (NaOH, KOH, etc.)
- Organic solution

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Classification:

Auxiliary equipment

Key words:

Auxiliary equipment

heating

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