Multi-process compatible liquid supply solution: How to reduce chemical reagent consumption by 30%?

In high-precision and advanced manufacturing fields such as semiconductor fabrication, display panel production, and photovoltaic cell manufacturing, chemical reagent consumption is a significant component of production costs. By optimizing the liquid supply system and adopting a "multi-process compatible liquid supply solution," not only can production flexibility be enhanced, but the usage of chemical reagents can also be significantly reduced.

I. Core Technological Support for the CDS Liquid Supply System

1. Precise Measurement and Dynamic Proportioning

• High-precision metering pump: Equipped with variable-frequency speed control technology, achieving flow control accuracy of ±1% to prevent over-supply of liquid.
• Closed-loop feedback system: Real-time monitoring of pipeline parameters via flow meters and pressure sensors, dynamically adjusting the mixing ratio (e.g., the proportion of ammonia water to hydrogen peroxide in SC-1 solution).

2. Modular Liquid Supply Architecture

• Dual-tank switching and cyclic filtration: The CDS system supports a dual-tank liquid supply setup (one in use, one standby), and during switching, residual liquid is mixed via a circulating pump to minimize transfer losses. Additionally, it features an integrated PFA filter (with a filtration precision of 0.2 μm), enabling the regeneration and reuse of etching and polishing fluids.
• Gas-liquid separation technology: Eliminates pipeline bubbles and prevents ratio deviations caused by flowmeter errors (e.g., improving the accuracy of hydrofluoric acid solution preparation to ±0.5%).

3. Intelligent Control and Predictive Maintenance

• PLC + Host Computer Integration: By analyzing data, proactively predict reagent consumption trends (e.g., correlating the usage of photolithography developer with wafer defect rates) to optimize the replenishment cycle.
• Leak Detection and Emergency Shut-Off: Dual-tube design + liquid-level sensor—automatically cuts off the fluid supply and triggers an alarm in case of a leak, minimizing accidental waste.

II. Consumption Reduction Strategies for Multi-Process Compatible Liquid Supply Solutions

1. Reagent Sharing and Pipeline Reuse (reducing costs by 15%-20%)

• Cross-process pipeline switching: Utilizing the VMB (Valve Manifold Box System) enables the shared pipeline transport of acids, bases, and organic solvents, reducing residual buildup in dedicated pipelines—for example, co-using a PFA line for sulfuric acid and isopropyl alcohol.
• Compatibility Matrix Design: Establish a chemical compatibility database (e.g., HF is incompatible with KOH, while IPA can coexist with acetone), preventing reagent waste caused by cross-contamination.

2. Recycling and Advanced Purification (reducing by 8%-12%)

Three-stage filtration system:

• Primary filtration: Removes particulates (such as silica powder, metal ions);
• Activated carbon adsorption: Degradation of organic pollutants (such as photoresist residues);
• Ion exchange resin: Restores acid-base concentrations (e.g., increasing the regeneration utilization rate of dilute sulfuric acid to 65%).

Reverse-rinse technology: After cleaning, wafers are rinsed in reverse using recycled water, reducing the consumption of fresh deionized water (resulting in a 40% reduction in water usage on a certain photovoltaic production line).

3. Process Collaboration and Parameter Optimization (reducing 5%-8%)

• Wet etching and cleaning integrated: Recover HF from the etching waste liquid to prepare SPM (sulfuric acid–hydrogen peroxide mixture), replacing fresh sulfuric acid.
• Temperature Gradient Control: Dynamically adjust the supply liquid temperature according to process requirements—for example, reducing the KOH developer temperature from 80°C to 75°C lowers the reaction rate while enhancing selectivity, thereby minimizing over-corrosion and material waste.

III. Implementation Pathways and Risk Mitigation

1. Phased Deployment:

• Pilot Phase: Select a single process (such as cleaning) to verify CDS compatibility;
• Expansion phase: Integrate processes such as etching and lithography, and establish a shared chemical pool.

2. Risk Control:

• Compatibility Testing: Determine chemical mixture stability through small-scale trials (e.g., compatibility of SC-2 solution with IPA);
• Redundant Design: Backup pump unit + dual-loop power supply, ensuring that system failures won’t cause a complete shutdown of the entire line. 3。

Summary

Through the precise control of the CDS system, multi-process pipeline reuse, advanced purification and reuse, and intelligent optimization, chemical reagent consumption can be systematically reduced by 30%. This solution requires customized design tailored to the specific characteristics of the production line, with a focus on overcoming two major technical challenges: compatibility verification and dynamic parameter adjustment. Ultimately, it will achieve a win-win outcome of cost savings and environmental benefits.

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