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Photoresist stripping process
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Process Technology
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Release time:
2021-08-17
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The photoresist stripping process is an important technology in the semiconductor manufacturing process, especially playing a key role in the production of integrated circuits. The purpose of photoresist stripping is to remove the photoresist by specific chemical or physical methods after the photolithography is completed, so as to obtain the desired chip structure.
There are many methods for photoresist stripping, among which chemical stripping and ultrasonic stripping are two commonly used methods. Chemical stripping uses the dissolving effect of chemical solvents to strip the photoresist. The specific steps include soaking the wafer to be processed in deionized water to remove surface impurities, then soaking it in a solvent that dissolves the photoresist for a period of time to soften the photoresist, and finally rinsing it with pure water or deionized water. Ultrasonic stripping uses the vibration of ultrasonic waves to break the bonds between photoresist molecules to achieve the purpose of separation.
In addition, the stripping process is also widely used in the graphic definition of some difficult-to-etch materials, such as precious metals and difficult-to-corrode materials. It is an important step in the manufacture of optical microcomponents, gas sensors, gas flow meters and other products. In new technological developments, such as full wet stripping processes, it has shown its advantages in removing highly injected photoresists, which can reduce processing cycle time and improve production efficiency.
In general, the photoresist stripping process is an indispensable part of semiconductor manufacturing and is of great significance for ensuring product quality and performance. In practical applications, the appropriate stripping method should be selected according to the specific product and process requirements, and precise process control should be performed. At the same time, with the continuous advancement of science and technology, the photoresist stripping process is also continuously innovating and developing to meet higher standards of manufacturing needs.
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