SRD Horizontal Spin Dryers

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SRD Horizontal Spin Dryers

Suitable for high-end wafer manufacturing processes that are sensitive to particle adsorption

Process Step
Application area
介绍

- Commodity name: SRD Horizontal Spin Dryers
Suitable for high-end wafer manufacturing processes that are sensitive to particle adsorption

SRD horizontal dryer uses the principle of centrifugal force to achieve material dehydration.

When the equipment is running, the motor drives the drum to rotate at high speed. The material is placed in the drum. Under the action of centrifugal force, the water in it is separated from the material and thrown out through the small holes on the drum wall because the centrifugal force is greater than the material's adhesion to water, thereby achieving material dehydration and drying.
Applicable to high-end wafer manufacturing processes that are sensitive to particle adsorption.

Commonly used in the production of high-precision, high-demand integrated circuit wafers and other scenarios.
- Textile printing and dyeing industry
- Chemical industry
- Food processing industry
It is more suitable for some wafer products that have high requirements for flatness and are not easily deformed due to horizontal placement during the drying process.

For example, for some large-sized and relatively thick power semiconductor wafers, horizontal spin dryers can better ensure their stability during the drying process.

The horizontal structure makes it relatively easy to access components such as the internal drum, and maintenance and cleaning work are relatively convenient. However, when operating the horizontal spin dryer, it is necessary to ensure that the wafer is accurately placed and fixed in the horizontal direction to prevent deviation or damage during high-speed rotation.

SRD vertical spin dryer

None

SRD vertical spin dryer

None

It is more suitable for some wafer products that have high requirements for flatness and are not easily deformed due to horizontal placement during the drying process.

For example, for some large-sized and relatively thick power semiconductor wafers, horizontal spin dryers can better ensure their stability during the drying process.

The horizontal structure makes it relatively easy to access components such as the internal drum, and maintenance and cleaning work are relatively convenient. However, when operating the horizontal spin dryer, it is necessary to ensure that the wafer is accurately placed and fixed in the horizontal direction to prevent deviation or damage during high-speed rotation.

Classification:

Drying Equipment

Key words:

Drying Equipment

material

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