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SRD vertical spin dryer
SRD vertical spin dryer
- Process Step
- Application area
- 介绍
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- Commodity name: SRD vertical spin dryer
The SRD spin dryer is an essential piece of equipment in the semiconductor manufacturing process.
Main function: Used to remove chemical solutions and moisture from wafer and device processes
Number of cavities: Single cavity / Double cavity
Size (reference): L×D×H = Width 480mm × Depth 820mm × Height 1750mm
Cleaning part Specification: 4 inch / 5 inch / 6 inch / 8 inch and other sizes of wafers or devices
Working speed: 300-2400r/min
Operating process: Manual feeding → DIW spray washing with rotor rotation → HOT N2 drying with rotor rotation → Accelerated spin drying with heated insulation of the cavity → Completion of the preset process of the equipment
Appearance material: Imported PPW 10t board
Machine positive pressure protection: Using N2 positive pressure protection
Process parameters: Particle size >0.2um with <30 particles
Radial vibration displacement <100um
Chip surface static voltage spv<200
Chip surface metal ion concentration <10ppm -
- Semiconductor manufacturing: In the production process of semiconductor chips, wafers need to go through multiple cleaning processes. SRD vertical spin dryers are used to remove moisture and chemical solvents from the surface of wafers, creating a clean working environment for subsequent photolithography, etching, deposition and other processes, ensuring the quality and performance of wafers and improving the yield rate of chips
- Photovoltaic industry: Used in the production process of solar cells, to spin dry silicon wafers and other materials after cleaning, to ensure the cleanliness and dryness of the cell surface, and to improve the photoelectric conversion efficiency of the cell
- Electronic component manufacturing: In the production of electronic components such as LCD and OLED, glass substrates, chips and other materials are dehydrated and dried to ensure the quality and stable performance of the products
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Wafer spin dryer is widely used in wet cleaning process. It is a high cleanliness rinsing and drying equipment with the characteristics of high cleanliness rinsing, high-speed drying, fast drying and high efficiency. It is the main equipment of wet cleaning process.
- High drying efficiency
- Good drying effect
- High cleanliness
- High degree of automation
- High reliability
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Wafer spin dryer is widely used in wet cleaning process. It is a high cleanliness rinsing and drying equipment with the characteristics of high cleanliness rinsing, high-speed drying, fast drying and high efficiency. It is the main equipment of wet cleaning process.
- High drying efficiency
- Good drying effect
- High cleanliness
- High degree of automation
- High reliability
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