WET PROCESS EQUIPMENT
Wet process equipment
Wet equipment is a kind of equipment used in wet processing processes, mainly used to extract, refine or separate liquid, gas or solid substances. Wet equipment typically includes components such as reactors, separators, coolers, heaters, and control systems. The most common wet process equipment includes distillation tower, extraction tower, precipitation tank, stirring tank, etc.
Wet process equipment technical support
We provide technical support for wet process equipment, including but not limited to equipment installation, commissioning, maintenance and troubleshooting. We have experienced engineer team, can provide customers with professional technical guidance and solutions. No matter what problems you encounter, we will be happy to solve for you, to ensure the normal operation of the equipment and production efficiency. At the same time, we also provide regular technical training and updates to ensure that your team is always up-to-date with the latest technical knowledge and capabilities. Please feel free to contact us, we will be happy to provide you with the best quality service.
wet process equipment
KOH Etching
The KOH etching of silicon wafers depends on the concentration and temperature of the solution. Kexin Micro produces manual and automatic wet workbenches that can precisely control these two parameters.
Pre-Diffusion Clean
The pre-diffusion cleaning process removes organics, silica layers, particles and metals and protects the regenerated oxides.
ultrasonic cleaning machine
The ultrasonic cleaning machine is an independent wet workbench designed to use ultrasonic waves of various frequencies to accurately clean semiconductor parts. Ultrasonic cleaners support the use of flammable solvents and water-based chemicals for cleaning. Process functions include heating, overflow recirculation, multiple chemicals, DIW rinsing, and drying.
Mega sonic cleaning machine
The megasonic cleaning machine is an independent wet workbench designed to use megasonic waves for precise cleaning of semiconductor parts. Megasonic cleaners support the use of flammable solvents and water-based chemicals for cleaning. Process functions include heating, overflow recirculation, multiple chemicals, DIW rinsing, and drying.