WET PROCESS EQUIPMENT

Wet process equipment

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Core Micro

Wet process equipment technical support

wet process equipment


KOH Etching

The KOH etching of silicon wafers depends on the concentration and temperature of the solution. Kexin Micro produces manual and automatic wet workbenches that can precisely control these two parameters.

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Pre-Diffusion Clean

The pre-diffusion cleaning process removes organics, silica layers, particles and metals and protects the regenerated oxides.

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ultrasonic cleaning machine

The ultrasonic cleaning machine is an independent wet workbench designed to use ultrasonic waves of various frequencies to accurately clean semiconductor parts. Ultrasonic cleaners support the use of flammable solvents and water-based chemicals for cleaning. Process functions include heating, overflow recirculation, multiple chemicals, DIW rinsing, and drying.

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Mega sonic cleaning machine

The megasonic cleaning machine is an independent wet workbench designed to use megasonic waves for precise cleaning of semiconductor parts. Megasonic cleaners support the use of flammable solvents and water-based chemicals for cleaning. Process functions include heating, overflow recirculation, multiple chemicals, DIW rinsing, and drying.

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RCA cleaning machine

BOE etching machine