SPM Clean Technology - Sulfuric Acid Mixture Cleaning Operation Guide

Category:

Process Technology

Author:

Source:

Release time:

2024-07-31

Visits:

Sulfuric acid mixed solution cleaning (SPM Clean)

SPM composition 98% H2SO4:30% H2O2=5:1 125℃

Main function:

Photoresist residue stripping
Removal of organic sticky dirt

Reaction mechanism:

Sulfuric acid can dehydrate organic matter and carbonize it, while hydrogen peroxide can oxidize the carbonized product into carbon monoxide or carbon dioxide gas.

H2SO4+H2O2 HO-(SO2)-O-OH<H2SO5>+H2O

HO-(SO2)-O-OH+ (CH2)nCO2+H2O

SPM,Sulfuric acid mixture cleaning,Photoresist residue stripping

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Technical Support Hotline: 86-13861996325

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