BOE Etching Process Introduction

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Process Technology

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Release time:

2024-07-31

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243

BOE, also known as oxide etching buffer, is a mixture of 40% NH4F and 49% HF. Sometimes some activators are added to the ingredients to improve the etching effect. BOE can be used to etch materials such as silicon oxide (SiO2), phospho-silicate glass (PSG), and boro-phosphorus glass (BPSG).

BOE has a variety of different ratios of liquid medicine: BOE (7:1) BOE (10:1) BOE (200:1)

Chemical reaction equation:

SiO2+HF SiF4

SiF4+2NH4F (NH4)2SiF6

B2O3+HF 2BF3+3H20

Because BOE has better etching selectivity than HF, many SiO2 etching processes use BOE solution.

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