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Marangoni drying principle
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Process Technology
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Release time:
2025-04-18
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What is Marangoni drying?
Marangoni drying is a drying technology that uses surface tension gradients to drive liquid flow. Its principle is based on the Marangoni effect.
What is the Marangoni effect?
The Marangoni effect was first studied and published in an 1865 paper by Italian physicist Carlo Marangoni, hence the name. When two liquids come into contact, the liquid with stronger surface tension exerts a stronger pull on the surrounding liquid, resulting in the phenomenon of the liquid with weaker surface tension penetrating towards the liquid with stronger surface tension. That is, the Marangoni effect occurs when two liquids come into contact.
What is the principle of Marangoni drying?
The principle of Marangoni drying is a technology that uses surface tension gradients to drive liquid flow, thereby achieving drying.
The specific process is as follows:
1. Preparation: Immerse the wafer in deionized water, with the top of the water filled with hot isopropyl alcohol (IPA) vapor.
2. Formation of surface tension gradient: Because the surface tension of IPA (20.9 × 10-3 N/m at 25 ℃) is much smaller than that of water (72.8 × 10-3 N/m), when there is a difference in surface tension at the contact line between the wafer and the water surface, a surface tension gradient will be formed on the surface of the water flow.
3. Generation of Marangoni effect: The water with strong surface tension pulls on the IPA with weak surface tension, causing the water to flow from the area with low surface tension to the area with high surface tension, that is, the water is "pulled back" to the water surface, while the IPA is pushed towards the wafer surface, replacing the water molecules.
4. Drying: By slowly lifting the wafer or draining the water, the wafer surface is gradually separated from the water surface. Using the Marangoni effect, the water on the wafer surface is quickly replaced, ultimately achieving drying.
The advantages of Marangoni drying include:
- Accepted by the industry as the best wafer drying method, leaving no watermarks after drying.
- The wafer does not contact air during the drying process, reducing the risk of contamination.
- Suitable for drying on wet bench type equipment.
The main disadvantage of Marangoni drying equipment is its relatively high price, which is its main drawback.
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