SC2 cleaning (Standard clean2)

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Process Technology

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Release time:

2024-07-31

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SC2 cleaning (Standard clean2)

Purpose: Used to remove metal contaminants such as sodium, iron, magnesium, and calcium on the surface of silicon wafers. SC2 can remove Fe and Zn at room temperature.

SC2 composition: HCL: H2O2: H2O=1:1:50 30~50℃

Principle of removing metal ions: Chloride ions in hydrochloric acid react with residual metal ions to form complexes that are easily soluble in aqueous solution, which can remove metal contaminants from the bottom layer of silicon.

Development trend of SC2 cleaning: According to reports, after a large number of experiments, it was found that HF+H2O2 liquid cleaning has a strong ability to remove metals. In some IC chip manufacturers, HF+H2O2 is often used instead of SC2 cleaning.

SC2,RCA Cleaning,Liquid No. 2

Pre

Natural oxide layer etching-HF Etch

SC1 cleaning (Standard clean1)

Natural oxide layer etching-HF Etch

SC1 cleaning (Standard clean1)

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