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QDR Tank

The QDR process module can quickly remove chemical residues on the substrate by using DIW

  • Standard Features
  • Optional Features
  • Application Area
  • Module Introduction
    • Commodity name: QDR Tank

    The QDR process module can quickly remove chemical residues on the substrate by using DIW

    • Material options: NPP, PVDF, PFA, or 316L stainless steel
    • PLC control, color touch screen
    • Programmable overflow, spray, water inlet time
    • PFA pneumatic valve
    • Adjustable top spray intensity and flow
    • Automatic self-cleaning cycle
    • Liquid level detection
    • High-purity PFA DIW pipeline
    • Automatically controlled quick exhaust valve
    • Customizable
    • Resistivity or conductivity monitoring
    • Deionized water recovery
    • Ultrasonic generator
    • Megasonde
    • Automatic cover or manual cover
    • Adapt to manual wet bench or automatic wet bench
  • Electronics industry, medical industry, semiconductor industry, watch and jewelry industry, optical industry, textile printing and dyeing industry, etc.

  • QDR Tank Process Module Introduction
     

      The QDR process module of Kexinwei can quickly remove chemicals from the substrate, reduce the use of DIW, and remove particulate matter from the substrate. The module includes formula-programmable overflow rinse, top spray, and fast discharge. Deionized water enters the bottom of the tank through the dispersion holes. This upward flow lifts particles and chemicals from the product and flows out through the overflow ports on all four sides. After the overflow time is programmed, the bottom quick drain valve opens and quickly discharges the rinse water. During the process, the top-mounted sprayer keeps the product moist with clean DIW. This cycle can be repeated through program recipe settings until the product is rinsed clean.
    The touch screen PLC provides the flexibility to edit the rinse program, and can set the time and number of sprays, overflows, and water injections. Automatic self-cleaning cycle rinse to eliminate bacterial growth.

QDR Tank Process Module Introduction
 

  The QDR process module of Kexinwei can quickly remove chemicals from the substrate, reduce the use of DIW, and remove particulate matter from the substrate. The module includes formula-programmable overflow rinse, top spray, and fast discharge. Deionized water enters the bottom of the tank through the dispersion holes. This upward flow lifts particles and chemicals from the product and flows out through the overflow ports on all four sides. After the overflow time is programmed, the bottom quick drain valve opens and quickly discharges the rinse water. During the process, the top-mounted sprayer keeps the product moist with clean DIW. This cycle can be repeated through program recipe settings until the product is rinsed clean.
The touch screen PLC provides the flexibility to edit the rinse program, and can set the time and number of sprays, overflows, and water injections. Automatic self-cleaning cycle rinse to eliminate bacterial growth.


Classification: