EKC Clean

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EKC Clean

EKC Clean is used to remove residues and impurities after etching, particularly for eliminating contaminants left behind after copper etching.
  • Process Step
  • Application area
  • 介绍
    • Commodity name: EKC Clean

    EKC Clean is used to remove residues and impurities after etching, particularly for eliminating contaminants left behind after copper etching.

    • STEP 1：EKC Tank
    • STEP 2：IPA Tank
    • STEP 3：QDR Tank
    • STEP 4：Dryer

  • Used in wafer manufacturing for cleaning before and after thin-film deposition, before dry etching, after ion implantation, before and after grinding, before and after annealing, before and after polishing, as well as in chemical wet etching cleaning processes.

  • Organic Wet Stripping (EKC Clean)

    EKC Clean efficiently cleans the etching residues from vias, both pre-existing and post-formed, and removes copper oxides from etched layers.

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Organic Wet Stripping (EKC Clean)

EKC Clean efficiently cleans the etching residues from vias, both pre-existing and post-formed, and removes copper oxides from etched layers.

Classification:

Cleaning Equipment

Key words:

Cleaning Equipment

tank

clean

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