Process Technology

Nov 17,2025

Applications of Semiconductor Cleaning Equipment

Semiconductor cleaning equipment plays a wide range of roles in the semiconductor manufacturing process, and its importance cannot be overlooked.

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Applications of Semiconductor Cleaning Equipment

Nov 12,2025

Types and Applications of Wet Etching Solutions

As semiconductor technology nodes continue to shrink, plasma-based dry etching has become the dominant process in integrated circuit manufacturing, thanks to its exceptional anisotropic etching capabilities.

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Types and Applications of Wet Etching Solutions

Nov 11,2025

Wafer Cleaning Methods After Etching

After wafer etching, cleaning is essential primarily to remove residual contaminants and impurities left over from the etching process, ensuring the cleanliness of the wafer surface.

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Nov 06,2025

Introduction to Wafer Cleaning Methods

Wafer cleaning is an indispensable and critical step in the semiconductor manufacturing process, aimed at effectively removing various contaminants from the wafer surface to ensure the quality and yield of subsequent processes.

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Nov 03,2025

Multi-process compatible liquid supply solution: How to reduce chemical reagent consumption by 30%?

In high-precision and advanced manufacturing fields such as semiconductor fabrication, display panel production, and photovoltaic cell manufacturing, the consumption of chemical reagents constitutes a significant portion of production costs.

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Multi-process compatible liquid supply solution: How to reduce chemical reagent consumption by 30%?

Oct 29,2025

The intelligent CDS liquid supply system achieves path-to-±1% concentration error control.

The path to achieving ±1% concentration error control in the intelligent CDS liquid supply system requires comprehensive measures spanning sensor technology, control algorithms, hardware optimization, and maintenance management.

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The intelligent CDS liquid supply system achieves path-to-±1% concentration error control.

Oct 27,2025

RCA Standard Cleaning Method

The RCA standard cleaning method is one of the most critical and widely used wet chemical cleaning techniques in the semiconductor industry.

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Oct 25,2025

How the CDS Automatic Acid Supply System Achieves Precise Control

The CDS system not only enhances the reliability and efficiency of the acid supply process but also reduces the need for manual intervention, aligning with the trend of intelligent manufacturing under the Industry 4.0 framework.

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How the CDS Automatic Acid Supply System Achieves Precise Control

Oct 22,2025

The cleaning principle of the acid-base corrosion machine

The acid-base corrosion cleaning machine, as an efficient and controllable surface treatment device, is widely used in fields such as metal processing, electronics manufacturing, and the automotive industry.

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The cleaning principle of the acid-base corrosion machine

Oct 20,2025

The process flow for KOH wet-etching silicon

Typical Process Flow for KOH (Potassium Hydroxide) Etching of Single-Crystal Silicon

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The process flow for KOH wet-etching silicon

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