Process Technology

Mar 28,2025

RCA Cleaning Four-Step Method: Unveiling the Core Technology of Atomic-Level Cleanliness on Semiconductor Wafer Surfaces

In semiconductor manufacturing, atomic-level cleanliness of the wafer surface is critical to ensuring chip yield and performance. The RCA cleaning method, as the core process of wet cleaning, can efficiently remove contaminants such as particles, organic matter, metal ions, and oxide layers from the wafer surface through precise chemical solution ratios and process control. This article details the chemical principles, operational procedures, and technical advantages of the four-step RCA cleaning method, and discusses its key role in semiconductor manufacturing.

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RCA Cleaning Four-Step Method: Unveiling the Core Technology of Atomic-Level Cleanliness on Semiconductor Wafer Surfaces

Jul 31,2024

SPM Clean Technology - Sulfuric Acid Mixture Cleaning Operation Guide

SPM composition: 98% H2SO4:30% H2O2=5:1

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SPM Clean Technology - Sulfuric Acid Mixture Cleaning Operation Guide

Jul 31,2024

BOE Etching Process Introduction

BOE, also known as oxidation etching buffer, is a mixture of 40% NH4F and 49% HF.

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Jul 31,2024

Study on H3PO4 Etching of Silicon Nitride

Used to remove the Si3N4 layer used as a hard mask to prepare for the next step

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Study on H3PO4 Etching of Silicon Nitride

Jul 31,2024

Natural oxide layer etching-HF Etch

DHF can remove the natural oxide film on the surface of silicon wafers

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Jul 31,2024

SC2 cleaning (Standard clean2)

SC2 cleaning is used to remove metal contamination such as sodium, iron, magnesium, calcium, etc. on the surface of silicon wafers

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Jul 31,2024

SC1 cleaning (Standard clean1)

SC1 cleaning is mainly used to remove particulate contamination (particles) and can also remove some metal impurities.

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Jul 28,2022

What are the wet cleaning process equipment?

Wet cleaning process equipment is a kind of cleaning equipment commonly used in industrial production. It mainly uses a combination of liquid cleaning agents and process equipment to clean the surface of objects.

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What are the wet cleaning process equipment?

Jan 10,2022

Chemical cleaning technology for solar silicon wafers!

Solar silicon wafers are the core components of the solar photovoltaic industry. Chemical cleaning is a critical part of its production process. This is because the cleanliness of the silicon wafer surface directly affects its photoelectric conversion efficiency.

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Chemical cleaning technology for solar silicon wafers!

Nov 12,2021

The pre-diffusion cleaning process removes organic matter, silica layers, particles and metals, protecting the regenerated oxide!

During the pre-diffusion cleaning process, the removal of organic matter, silicon dioxide layers, particles and metals is a critical step, while protecting the regenerated oxide is also an indispensable part. This cleaning process is critical to ensure the quality and performance of semiconductor devices.

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The pre-diffusion cleaning process removes organic matter, silica layers, particles and metals, protecting the regenerated oxide!

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