Process Technology

Jul 04,2025

What are the advantages of wet etching? High selectivity: Wet etching can achieve highly selective etching of the target material while having a relatively small impact on other materials.

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Jul 02,2025

Cleaning principles of SC1 and SC2

SC1 and SC2 are two commonly used wet cleaning processes in semiconductor manufacturing, primarily used to remove contaminants from the surface of silicon wafers. The cleaning principles are as follows:

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Jun 30,2025

Semiconductor wet process drying

Drying processes, as the final step in semiconductor wet cleaning, directly determine the quality of the wafer surface. This article systematically reviews the principles, equipment composition, and performance characteristics of mainstream technologies such as spin drying, IPA drying, Marangoni drying, slow pulling and infrared (IR) drying, and analyzes their applicable scenarios and limitations.

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Jun 27,2025

The difference between wet etching and wet cleaning in semiconductors

In semiconductor device manufacturing, wet etching and wet cleaning are two key wet chemical processes. Although both involve immersing the wafer in a chemical solution for processing, their process purposes and operating methods are different.

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The difference between wet etching and wet cleaning in semiconductors

Jun 25,2025

What are the different grades of PFA tubing?

PFA pipe grade

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What are the different grades of PFA tubing?

Jun 23,2025

Wet etching applications in semiconductors

Wet etching, a core process in microelectronics manufacturing, utilizes chemical etchants such as acids, bases, or solvents to react with the substrate material, generating soluble products to achieve selective material removal. Its process efficiency and precision directly affect the performance of integrated circuits, optical devices, and microelectromechanical systems (MEMS).

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Wet etching applications in semiconductors

Jun 20,2025

Wafer cleaning process

Wafer cleaning processes typically involve multiple steps to ensure the complete removal of contaminants and a perfectly clean surface.

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Jun 18,2025

Application of PFA tubing in semiconductor cleaning equipment

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Jun 16,2025

Fully automatic RCA cleaning machine, what are the advantages of the RCA cleaning method?

A fully automatic RCA cleaning machine is a device used for a series of cleaning steps in the manufacturing of high-tech products such as semiconductors, microelectronics, and optoelectronics. It uses the RCA cleaning method, which employs solvents, acids, surfactants, and water to remove contaminants, organic matter, and metal ion contamination from the wafer surface by spraying, purification, oxidation, etching, and dissolution without damaging the surface features of the wafer. After each use of chemicals, a thorough cleaning in ultrapure water (UPW) is required.

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Fully automatic RCA cleaning machine, what are the advantages of the RCA cleaning method?

Jun 13,2025

Organic Cleaning Process Flow

Wet chemical organic cleaning in semiconductor manufacturing is a crucial process for removing organic contaminants (such as photoresist, resin, grease, etc.). This process must balance high cleanliness with the protection of device structures. The following are typical process flows and technical points:

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