Process Technology

Aug 11,2025

Key Measures for Particle Control in Wet Cleaning Equipment—Source Prevention and Control

Particles can cause short circuits, open circuits, or performance degradation in devices. Achieving low particle counts requires a systematic approach involving multiple dimensions, including source prevention, cleaning process optimization, equipment maintenance, and environmental management.

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Key Measures for Particle Control in Wet Cleaning Equipment—Source Prevention and Control

Aug 08,2025

Megahertz ultrasonic cleaning: a technological engine for micron-level cleanliness

In modern precision manufacturing and scientific research, cleanliness is a core element determining product quality and performance. Faced with increasingly stringent cleaning requirements, megasonic cleaning technology, with its high-frequency, high-efficiency, and precise characteristics, has become an innovative force that breaks through traditional cleaning bottlenecks, providing crucial cleanliness assurance for high-end industries.

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Megahertz ultrasonic cleaning: a technological engine for micron-level cleanliness

Aug 06,2025

The impact of particle contamination in wafer manufacturing

Particle contamination in wafer manufacturing can affect the quality, performance, and reliability of the final chip product in several ways.

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The impact of particle contamination in wafer manufacturing

Aug 01,2025

Common solutions for wet etching

Commonly used wet etching solutions include phosphoric acid, hydrofluoric acid, buffered oxide etchant (BOE), aluminum etchant (M2), and nitric acid.

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Jul 30,2025

SC-2 Cleaning Solution Composition

SC-2 Cleaning Solution Application Areas: Semiconductor manufacturing (RCA standard cleaning process) Core Function: Removes metal contaminants and organic residues from the wafer surface

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Jul 28,2025

Steps for cleaning silicon wafers

Wafer cleaning is a crucial process in semiconductor manufacturing, aimed at removing surface contaminants (particles, organic matter, metal ions, native oxide layers, etc.) to ensure the quality and yield of subsequent processes (such as lithography, oxidation, diffusion, and thin film deposition).

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Jul 25,2025

Megahertz ultrasonic cleaning technology: principles and advantages

Megahertz ultrasonic cleaning technology, as an advanced precision cleaning method, plays an important role in modern manufacturing and scientific research.

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Megahertz ultrasonic cleaning technology: principles and advantages

Jul 23,2025

Core Advantages of RCA Cleaning Machine

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Jul 21,2025

Applications of quartz in semiconductors

Quartz materials, due to their unique physicochemical properties, play an indispensable role in modern semiconductor manufacturing processes. This article systematically introduces the basic properties, processing technology, and wide applications of quartz in semiconductor equipment.

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Applications of quartz in semiconductors

Jul 18,2025

CDS fluid supply system composition and basic requirements

The CDS automatic liquid supply system is a centralized system used for the automatic and continuous supply of chemical liquids on production lines. The CDS liquid supply system mainly consists of four parts: liquid supply cabinet, liquid supply source, transmission system, and control system.

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CDS fluid supply system composition and basic requirements

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