Process Technology

Nov 09,2021

Wet Cleaning Technology in Semiconductor Manufacturing

Wet cleaning technology in semiconductor manufacturing is a key process link, and its main purpose is to use various inorganic or organic chemical reagents to remove impurities attached to the surface of the wafer. These impurities may come from the air, human body, factory buildings, production equipment, chemicals, auxiliary materials, etc., including dust, organic matter, inorganic matter and metal ions.

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Nov 09,2021

The processes covered by wet equipment include cleaning, etching, degumming, and scrubbing.

The process of wet equipment coverage does include steps such as cleaning, etching, stripping, and scrubbing. These steps play a vital role in semiconductor manufacturing and other related fields.

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The processes covered by wet equipment include cleaning, etching, degumming, and scrubbing.

Aug 17,2021

Photoresist stripping process

The photoresist stripping process is an important technology in the semiconductor manufacturing process, especially playing a key role in the production of integrated circuits. The purpose of photoresist stripping is to remove the photoresist through specific chemical or physical methods after the photolithography is completed, so as to obtain the desired chip structure.

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