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Photoresist Stripper
photoresist stripping process
Photoresist Stripper
photoresist stripping process
KOSEN's photoresist stripping process is a common process in semiconductor manufacturing, which mainly involves leaving photoresist on the substrate in the area where the film is not needed by photolithography process, depositing a layer of film on its surface, and finally soaking it in a stripping solution that does not corrode the film.
With the dissolution of the photoresist in the etching solution, the film on the photoresist is also stripped along with the photoresist, thereby obtaining a desired film pattern.
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Wet process organic solvent cleaning, touch human-machine or PC interface with PLC software control.
Compatible with 6/8-inch cassette types.
EKC Clean is used to remove residues and impurities after etching, particularly for eliminating contaminants left behind after copper etching.
Cleaning methods commonly used in semiconductor manufacturing processes
Horizontal Quartz Tube Basket Cleaning Machine
The horizontal quartz tube basket cleaning machine is designed for immersion cleaning of components such as quartz tubes, baskets, quartz plates, ignition guns, and bases.
Pre-diffusion cleaning removes chemical residues and particles from the wafer surface. It helps protect the regeneration of the oxide layer.
Technical Support Hotline
E-MAIL:
Technical Support Hotline: 86-13861996325
Address:
4th Floor, Building 5, No. 2 Haiyang South Road, Chengnan Street, Rugao City, Jiangsu Province
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