Pre-Diffusion Clean

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Pre-Diffusion Clean

Pre-diffusion cleaning removes chemical residues and particles from the wafer surface. It helps protect the regeneration of the oxide layer.

Process Step
Application area
介绍

- Commodity name: Pre-Diffusion Clean
Pre-diffusion cleaning removes chemical residues and particles from the wafer surface. It helps protect the regeneration of the oxide layer.
- STEP 1：HF (50:1) – Constant Temperature Tank
- STEP 2：Rinse – QDR Tank
- STEP 3：SC1 – Heated Filter Tank
- STEP 4：QDR Tank
- STEP 5：SC2 – Heated filter Tank
- STEP 6： QDR Tank(Megasonic cleaning tank optional)
- STEP 7：Dry – Marangoni Drying
Used in wafer manufacturing for cleaning before and after thin-film deposition, before dry etching, after ion implantation, before and after grinding, before and after annealing, before and after polishing, as well as in chemical wet etching cleaning processes.
This cleaning process is performed multiple times during wafer manufacturing. The goal is to thoroughly eliminate chemical residues and particles each time.

KOSEN SEMI’s pre-diffusion cleaning process effectively removes organic materials, silicon dioxide layers, particles, metals, and ensures the regeneration of protective oxide layers.
- Manual Etching Equipment
- Semi-automatic Etching Equipment
- Fully Automatic Etching Equipment

Horizontal Quartz Tube Basket Cleaning Machine

None

Horizontal Quartz Tube Basket Cleaning Machine

None

This cleaning process is performed multiple times during wafer manufacturing. The goal is to thoroughly eliminate chemical residues and particles each time.

KOSEN SEMI’s pre-diffusion cleaning process effectively removes organic materials, silicon dioxide layers, particles, metals, and ensures the regeneration of protective oxide layers.

Manual Etching Equipment
Semi-automatic Etching Equipment
Fully Automatic Etching Equipment

Classification:

Key words:

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