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Process Technology
Company News
Industry News
Jun 10,2026
Xinye Era’s first 8-inch chip production line in Northwest China has entered operation, with a yield rate exceeding 95%.
Key words:
Jun 08,2026
Metal Removal Mechanism of SC-2 Cleaning Solution
SC-2 cleaning solution (an HCl/H₂O₂/H₂O mixed system) leverages a triple synergistic mechanism—oxidation, complexation, and acid inhibition—to efficiently remove metallic contaminants from silicon wafer surfaces, achieving removal rates exceeding 99.99%.
May 26,2026
SC-1 Cleaning Solution
SC-1 (Standard Clean 1) is a core step in the RCA cleaning process, formulated by mixing NH₄OH, H₂O₂, and H₂O in specific proportions.
May 25,2026
Ziguang Guowei Acquires Ruineng Semiconductor for RMB 1.9 Billion
May 22,2026
Process Control and Safety in SPM
SPM (sulfuric acid–hydrogen peroxide mixture) is a highly oxidizing cleaning solution commonly used in semiconductor manufacturing, and its process control as well as safety and environmental management are of paramount importance.
May 21,2026
NVIDIA’s first-quarter revenue surged 85% to $81.6 billion.
On Wednesday, May 20, NVIDIA announced another record-breaking quarterly performance.
May 20,2026
SC-2 Cleaning Solution
SC-2 cleaning solution is one of the core steps in the RCA standard cleaning process, introduced by the U.S. company RCA in 1970 and specifically designed to remove alkali metal ions and heavy metal impurities from the surface of semiconductor wafers.
May 18,2026
China’s first 10,000‑core‑class optical cable has entered mass production in Optics Valley.
Recently, FiberHome Technologies has successfully developed a 13,824‑core ultra‑large‑core-count optical cable and has already achieved mass production of this high‑core‑count product.
May 15,2026
Changhua Technology’s projects in semiconductor packaging materials and precision molds have been signed in Weihai.
A signing ceremony was held for cooperative projects involving Changhua Technology’s semiconductor packaging materials and precision molds, among others.
Main application scenarios of SPM in wafer cleaning
The two primary application scenarios for SPM are: removing hardened photoresist after ion implantation and eliminating organic contamination.